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Canon says they can do the equivalent to a 5 nanometer process while being 10x cheaper. They also say that with updates to the same technology they will in the future do the equivalent to a 2 nanometer process.

  • The latest “nanoimprint lithography” system is Canon’s challenge to Dutch firm ASML, which dominates the extreme ultraviolet (EUV) lithography machine space.
  • Canon said its latest machine, called the FPA-1200NZ2C, will be able to make semiconductors equivalent to a 5 nanometer process, and go as small as 2nm.